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The Primo nanova® tool is AMEC’s advanced 300mm etch product based on Inductively Coupled Plasma (ICP) technology. It is a cluster tool which can be configured with up to six chambers and two optional on-board integrated strip chambers. The chamber is symmetrical in design with high flow conductance. The ICP coils employ AMEC’s proprietary low capacitive coupling 3D coil design which enables more independent ion density and ion energy control. The chamber interior is coated with high-density plasma-resistant material for greater process repeatability and productivity. For wafer CD uniformity control, there is a high dynamic range multi-zone direct temperature-controlled ESC (electrostatic chuck). The product is intended for 1x or beyond etch applications for logic and memory devices.

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              Primo nanova® 
              Innovative etch solution for logic and DRAM devices at 1x and beyond
              Products Features
              Truly symmetric chamber design
              Low capacitive coupling 3D coil design
              High pumping speed with large capacity turbo pump (TMP)
              Precise chamber wall temperature control
              Advanced plasma-resistant interior coating
              Multi-zone temperature-controlled ESC
              Active impedance tuned focus ring design
              Switchable dual frequency RF biasing
              Integrated dual strippers
              Durga ESC ready for selecting
              Competitive Advantages
              More independent ion energy and ion density controllability
              Higher pumping conductance for wider process window
              Excellent etch uniformity
              Superior profile control for high aspect ratio application
              High productivity p